JPH0341972B2 - - Google Patents
Info
- Publication number
- JPH0341972B2 JPH0341972B2 JP56129627A JP12962781A JPH0341972B2 JP H0341972 B2 JPH0341972 B2 JP H0341972B2 JP 56129627 A JP56129627 A JP 56129627A JP 12962781 A JP12962781 A JP 12962781A JP H0341972 B2 JPH0341972 B2 JP H0341972B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- substrate
- alignment
- mark
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56129627A JPS5831526A (ja) | 1981-08-19 | 1981-08-19 | 焼付装置のアライメント装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56129627A JPS5831526A (ja) | 1981-08-19 | 1981-08-19 | 焼付装置のアライメント装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5831526A JPS5831526A (ja) | 1983-02-24 |
| JPH0341972B2 true JPH0341972B2 (en]) | 1991-06-25 |
Family
ID=15014159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56129627A Granted JPS5831526A (ja) | 1981-08-19 | 1981-08-19 | 焼付装置のアライメント装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5831526A (en]) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63232319A (ja) * | 1987-03-20 | 1988-09-28 | Fujitsu Ltd | ウエハの位置合わせ処理方法 |
| JP2789487B2 (ja) * | 1990-02-28 | 1998-08-20 | 住友重機械工業株式会社 | スリットと回折格子による相対位置検出装置 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51116942U (en]) * | 1975-03-17 | 1976-09-22 | ||
| JPS51120180A (en) * | 1975-04-15 | 1976-10-21 | Nippon Telegr & Teleph Corp <Ntt> | Pattern printing device |
| JPS5331972A (en) * | 1976-09-05 | 1978-03-25 | Nippon Telegr & Teleph Corp <Ntt> | Positioning method of two plate form bodies |
| JPS5381082A (en) * | 1976-12-27 | 1978-07-18 | Fujitsu Ltd | Controlling method for holding extreme valies |
| JPS5916291B2 (ja) * | 1977-04-28 | 1984-04-14 | ファナック株式会社 | 主軸制御方式 |
-
1981
- 1981-08-19 JP JP56129627A patent/JPS5831526A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5831526A (ja) | 1983-02-24 |
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